Institute of Functional Interfaces

Optical properties of radio-frequency magnetron sputtered α-(Cr1-xAlx)2O3 thin films grown on α-Al2O3 substrates at different temperatures

  • chair:

    Gao, Y. / Leiste, H. / Heissler, S. / Ulrich, S. / Stueber, M. (2018)

  • place:

    Thin Solid Films 660, 2018, 439–446

  • Date: Juni 2018


We report the optical properties of the (Cr1-xAlx)2O3 thin films (0.08≤x≤0.16) with a thickness of ~300 nm
grown on c-plane (0001) α-Al2O3 substrates at different temperatures (i.e. room temperature, 320 °C and 400 °C)
by non-reactive radio-frequency magnetron sputtering. (0001) oriented single-phase corundum structured
crystalline thin films were grown at temperatures of 320 °C and 400 °C, while the films deposited at room
temperature are amorphous. The stoichiometric composition of the films was analyzed and verified by electron
probe micro-analyses. The phase composition and lattice parameter c were characterized by X-ray diffraction in
Bragg-Brentano geometry. The crystal quality increases with increasing the deposition temperature independent
of the film composition, and the lattice constant c increases with decreasing the Al concentration which is
independent of the deposition temperature. Raman spectra supported the interpretation of phase composition
analysis and showed a significant shift of phonon frequency with Al concentration and the substrate temperature.
Infrared reflection absorption spectroscopy of the films was carried out to determine the absorption band
shifts in relation to the lattice parameter c which the smaller lattice constant c the larger frequency of the Eu
mode. Further, the band gap of the thin films was calculated from visible light absorption spectra.